Feedback | Join Now

HOME | CURRENT | ARCHIVES | ANNOUNCEMENTS | ONLINE SUBMISSION | RESOURCES | ABOUT US
 
Transactions of the INDIAN CERAMIC SOCIETY   Vol. 69  2010
A Short Review on the Pulsed Laser Deposition of Er3+ Ion Doped Oxide Glass Thin Films for Integrated Optics
M. Irannejad, Z. Zhao, G. Jose, D. P. Steenson** and A. Jha*
Pages: 207-221
DOI : 10.1080/0371750X.2010.11090838
Abstract
Short pulsed (ns) excimer laser was employed as a technique for the deposition of more than 2 m thick glassy films from phosphorous pentoxide and tungsten lanthanum modified tellurite bulk glasses. High quality glass thin films with measured propagation loss less than 0.15, 0.71 and 2.3 dB.cm–1 were obtained after optimization of deposition parameters for silica, siloxane and semiconductor substrates. The optical, spectroscopic and microstructural properties of deposited thin films were compared with bulk glass materials for demonstrating the differences in the properties, which must be optimized for device engineering. Channel waveguides were fabricated after using reactive ion etching technique, up to 2 m thickness by using CHF3 and Ar gas mixture.
Full text : Subscribe to Download Full Text
[Go Back]
 
MAIN PAGE | SITE MAP | PRIVACY POLICY | TERMS & CONDITIONS  | CONTACT US | FEEDBACK
Copyright © Protected 2008, The Indian Ceramic Society. All right reserved.

Developed By : Hi-Tech Soft & Multimedia